6.1 电源装置Power Supply Unit
6.2 控制系统Control System
6.3 驱动装置Drive Unit
6.4 传感器与变送器Sensors and Transmitters
6.5 人机交互界面Human-Machine Interface (HMI)
6.6 工业电源Industrial Power Supplies
PVD、CVD、ALD 镀膜、等离子刻蚀、离子注入电源分类
PVD 镀膜电源种类Types of PVD Coating Power Supplies
高功率脉冲磁控溅射（HPPMS）电源 High Power Pulsed Magnetron Sputtering (HPPMS) Power Supply | 非平衡磁控溅射电源 Unbalanced Magnetron Sputtering Power Supply | 直流脉冲电源 DC Pulse Power Supply | 多弧离子镀电源 Multi-arc Ion Plating Power Supply |
脉冲电弧放电电源 Pulsed Arc Discharge Power Supply | 交流电源（交流溅射电源） AC Power Supply (AC Sputtering Power Supply) | 阴极过滤电弧电源 Cathodic Filtered Arc Power Supply | 中频孪生靶磁控溅射电源 Medium-Frequency Twin- Target Magnetron Sputtering Power Supply |
中频孪生靶非平衡电源 Medium-Frequency Twin- Target Unbalanced Power Supply | 脉冲激光沉积（PLD）电源 Pulsed Laser Deposition (PLD) Power Supply | 直流磁控溅射双靶电源 DC Magnetron Sputtering Dual-Target Power Supply | 电弧 - 磁控复合电源 Arc-Magnetic Control Composite Power Supply |
磁控溅射偏压电源 Magnetron Sputtering Bias Power Supply | 电子束蒸发电源 Electron Beam Evaporation Power Supply
| 离子束源电源 Ion Beam Source Power Supply | 双离子束溅射电源 Dual Ion Beam Sputtering Power Supply |
镀膜电源种类Types of Coating Power Supplies
| 微波等离子体电源（2.45GHz） | 射频等离子体电源（13.56MHz）
Radio Frequency Plasma Power Supply (13.56MHz) |
中频等离子体电源（40-100kHz）
Medium Frequency Plasma Power Supply (40-100kHz) | 热丝化学气相沉积（HFCVD）电源
Hot Filament Chemical Vapor Deposition (HFCVD) Power Supply |
光化学气相沉积（Photo-CVD）电源
Photochemical Vapor Deposition (Photo-CVD) Power Supply | 微波电源（用于微波 CVD）
Microwave Power Supply (for Microwave CVD) |
直流等离子体电源
DC Plasma Power Supply | 电感耦合等离子体（ICP）电源(用于 ICP-CVD）
Inductively Coupled Plasma (ICP) Power Supply (for ICP-CVD) |
远程等离子体电源 (用于远程等离子体增强 CVD，RPECVD）
Remote Plasma Power Supply (for Remote Plasma-Enhanced CVD, RPECVD) | 等离子体增强化学气相沉积（PECVD）的射频感应耦合电源
Radio Frequency Inductively Coupled Power Supply for Plasma-Enhanced Chemical Vapor Deposition (PECVD) |
金属有机化学气相沉积(MOCVD)的多通道温度控制电源
Multi-Channel Temperature-Controlled Power Supply for Metal-Organic Chemical Vapor Deposition (MOCVD) | 离子束辅助沉积（IBAD）电源
Ion Beam-Assisted Deposition (IBAD) Power Supply |
ALD 镀膜电源种类Types of ALD Coating Power Supplies
脉冲微波等离子体辅助 ALD 电源
Pulsed Microwave Plasma-Assisted ALD Power Supply | 交流电场辅助 ALD 电源
AC Electric Field-Assisted ALD Power Supply |
脉冲射频电源（用于特定 ALD 工艺）
Pulsed Radio Frequency (RF) Power Supply (for specific ALD processes) | 脉冲直流电源（用于 ALD 的某些特殊需求）
Pulsed Direct Current (DC) Power Supply (for certain special requirements of ALD) |
微波辅助 ALD 电源（用于微波增强 ALD）
Microwave-Assisted ALD Power Supply (for microwave- enhanced ALD) | 等离子体增强原子层沉积（PEALD）的脉冲微波与射频复合电源
Combined Pulsed Microwave and RF Power Supply for Plasma-Enhanced Atomic Layer Deposition (PEALD) |
原子层沉积（ALD）的交流电场与热辅助复合电源
Combined AC Electric Field and Thermal-Assisted Power Supply for Atomic Layer Deposition (ALD) | 光辅助原子层沉积（Photo-ALD）紫外光源电源
Ultraviolet (UV) Light Source Power Supply for Photo-Assisted Atomic Layer Deposition (Photo-ALD) |
离子注入与刻蚀电源Ion Implantation and Etching Power Supply
离子注入电源 Ion Implantation Power Supply | 反应离子刻蚀（RIE）电源 Reactive Ion Etching (RIE) Power Supply |
高频等离子体聚合电源（40-100MHz） High-Frequency Plasma Polymerization Power Supply (40-100MHz) | 大气压低温等离子体电源 Atmospheric Pressure Low-Temperature Plasma Power Supply |
容性耦合等离子体（CCP）电源 Capacitively Coupled Plasma (CCP) Power Supply | 脉冲等离子体聚合电源 Pulsed Plasma Polymerization Power Supply |
